Hafnium tetrachloride | HfCl4 powder | CAS 13499-05-3 | factory price

Short Description:

Hafnium tetrachloride has important applications as a precursor of hafnium oxide, catalyst for organic synthesis, nuclear applications, and thin film deposition, highlighting its versatility and importance in various technological fields.

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Product Description

Brief introduction

Product Name: Hafnium tetrachloride
CAS No.: 13499-05-3
Compound Formula: HfCl4
Molecular Weight: 320.3
Appearance: White powder

Specification

Item	Specification
Appearance	White Powder
HfCl4+ZrCl4	≥99.9%
Zr	≤200ppm
Fe	≤40ppm
Ti	≤20ppm
Si	≤40ppm
Mg	≤20ppm
Cr	≤20ppm
Ni	≤25ppm
U	≤5ppm
Al	≤60ppm

Application

Hafnium Dioxide Precursor: Hafnium tetrachloride is primarily used as a precursor to produce hafnium dioxide (HfO2), a material with excellent dielectric properties. HfO2 is widely used in high-k dielectric applications for transistors and capacitors in the semiconductor industry. HfCl4 is essential in the manufacture of advanced electronic devices due to its ability to form thin films of hafnium dioxide.
Organic synthesis catalyst: Hafnium tetrachloride can be used as a catalyst for various organic synthesis reactions, especially olefin polymerization. Its Lewis acid properties help to form active intermediates, thereby improving the efficiency of chemical reactions. This application is valuable in the production of polymers and other organic compounds in the chemical industry.
Nuclear Application: Due to its high neutron absorption cross section, hafnium tetrachloride is widely used in nuclear applications, especially in control rods of nuclear reactors. Hafnium can effectively absorb neutrons, so it is a suitable material for regulating the fission process, which helps to improve the safety and efficiency of nuclear power generation.
Thin Film Deposition: Hafnium tetrachloride is used in chemical vapor deposition (CVD) processes to form thin films of hafnium-based materials. These films are essential in a variety of applications, including microelectronics, optics, and protective coatings. The ability to deposit uniform, high-quality films makes HfCl4 valuable in advanced manufacturing processes.